Fabrication of Photocrosslinkable Polysilane/diarylfluorene Blended Films with Tunable Refractive Indices
Haruyuki Okamura, Osaka Prefecture University
Abstract:We devised the photocrosslinked films of diphenyl- or dinaphthylfluorene having epoxy or oxetane moieties and polysilanes blends in the presence of a photoacid generator on irradiation at 405 nm. The cationic photocrosslinking properties of the blends were strongly affected by PEB conditions and irradiation dose. We successfully fabricated the films with high refractive indices (nd: 1.70) which were tunable by irradiation at 254 nm.